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Division: Thin Film (TF)

Home Division: Thin Film (TF)

The Thin Film Division (TF) offers several oral sessions and one poster session. The program broadly covers thin film fundamentals, materials, processing, and applications. Fundamental research in thin film is addressed in exciting sessions such as “Controlling Microstructure and Accessing Nonequilibrium Phases in Thin Films”. State-of-the-art materials and processing research are highlighted in sessions such as “Organic and Polymeric Materials”, “Emerging and Advanced Materials and Processes,” and others that include papers on organic/inorganic hybrid materials and vapor phase infiltration of metal-organic frameworks and other network materials. The TF program is heavily integrated with the Atomic Scale Processing Mini-Symposium (AP), which includes sessions related to atomic layer deposition and etching (ALD/ALE), area selective processing and patterning, and novel precursor development. In the applications arena, the TF program includes papers from a variety of fields, including batteries, electronics, and space technologies. Again this year, we honor the late Prof. Paul H. Holloway through the eponymous Young Investigator Award, with this year’s recipient’s paper noted in the program. TF will also host the popular student-focused session in which James Harper Award finalists will share their work in interactive “TED-Talk” style presentations.

TF1-TuA: Catalytic and Active Materials

  • Ola Nilsen, University of Oslo, Norway, “MLD as a Sandbox for Photoactive Hybrid Materials”

TF2-TuA: Thin Films for Battery Applications

  • Mark Huijben, University of Twente, Netherlands, “Superior Microbatteries by Tailoring Epitaxial Interfaces”

TF1+PS-WeM: Emerging and Advanced Materials and Processes

  • Ashley Bielinski, Argonne National Laboratory, “Time-Resolved ALD Reaction Heat”
  • Stephen Stagon, University of North Florida, “Modified Reactive Sputter Deposition of Titanium Nitride Thin Films via HIPIMS with Kick-Pulse”

TF2+AP+SE+SS-WeM: Controlling Microstructure and Accessing Non-Equilibrium Phases in Thin Films

  • Lauren Garten, Georgia Institute of Technology, “Stabilizing Polar Polymorphs of Scandium Ferrite for Photovoltaics”

TF+QS-WeA: Thin Films for Space and Electronic Applications

  • Christine Charles, Australian National University, Australia, “From Space Thrusters to Exoplanets Research”
  • Frank Greer, Jet Propulsion Laboratory (NASA/JPL), “Atomic Scale Processing and Surface Engineering to Maximize Microdevice Performance for Remote Sensing and Imaging Applications”

TF-ThM: Creating Organic-Inorganic Hybrid Materials

  • Diana Berman, University of North Texas, “Functional Ceramic Heterostructures via Vapor and Liquid Phase Infiltration of Polymer Templates”

TF-ThA: Organic and Polymeric Materials

  • Joerg Lahann, University of Michigan, Ann Arbor, “Chemical, Biological, and Topological Control Using Chemical Vapor Deposition Polymerization”

TF+SE-FrM: Metal-Organic Frameworks and Other Network Materials

  • Mikhael Bechelany, CNRS/European Institute of Membranes, France, “Membrane Design by Atomic Layer Deposition”

TF18+AP: Manufacturing and Scale-Up of CVD and (Spatial) ALD

TF-ThP: Thin Film Poster Session

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Key Dates

Major Awards Deadline:
March 31, 2023

Student Awards Deadline:
May 31, 2023

Call for Late-Breaking Abstracts Deadline:
September 15, 2023

Early Registration Deadline:
October 2, 2023

Housing/Hotel Extended Deadline:
October 18, 2023

Contact

Yvonne Towse
Conference Administrator
125 Maiden Lane; Suite 15B
New York, N.Y. 10038
yvonne@avs.org

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