The Applied Surface Science Division is the premier gathering place for the global community of scientists and engineers who perform research in the preparation, characterization, modification, and utilization of surfaces and interfaces for applications of practical importance. At this year’s symposium, contributors will present fundamental research along with cutting-edge applied studies. The session topics include “Multi-Modal & Multi-Dimensional Analysis” (WeM) with a focus on the use of multiple methods including operando for the characterization of materials in strategic areas of 2D materials, CHIPs Act-related materials, battery technology, and molecular structure-function. The “Quantitative Surface Analysis” (WeA & ThM) session offers a deep-dive into quantitative analysis with an emphasis on photoelectron spectroscopy including reference materials, calibration and binding energy referencing, background and peak fitting, and nondestructive characterization, and also highlighting the Peter M.A. Sherwood Mid-Career Award presentation. The “Industrial Applications” (FrM) session delivers perspectives on practical approaches for problem-solving and metrology with topics including beam-sensitive samples, battery materials, quantification, and machine learning. The division will also sponsor a robust poster session on these subjects Thursday evening. The division will hold its annual Business Meeting and Awards Ceremony on Tuesday evening. Highlights of this event include the student award competition and the ASTM E42 Committee on Surface Analysis forum. All members of the Applied Surface Science community are invited to attend.
AS+2D+CA+EL+EM+MS+NS+SE+SS+TF-WeM: Multi-Modal & Multi-Dimensional Analysis
- Alain Diebold, SUNY Polytechnic Institute, “Optical and X-Ray Characterization and Metrology of Si/Si(1-X)Ge(X) Nanoscale Superlattice Film Stacks and Structures”
- Glenn Jernigan, US Naval Research Laboratory, ” Growth and Characterization of Large-Area 2D Materials “
AS+CA+EL+EM+SE+SS+TF-WeA: Quantitative Surface Analysis I
AS+CA+EL+EM+SE+SS+TF-ThM: Quantitative Surface Analysis II
- “ASSD Peter M. A. Sherwood Mid-Career Professional Awardee Talk”
AS+2D+CA+EM+MS+NS+SE+SS+TF-FrM: Industrial Applications
- Jean-Paul Barnes, Univ. Grenoble Alpes, CEA, Leti, France, “Correlative Analysis Using Time-of-flight Secondary Ion Mass Spectrometry for Beam Sensitive Samples”
- Marko Sturm, University of Twente, Netherlands, “Probing Thin Film Interfaces at the Nanoscale by Low Energy Ion Scattering”
AS-ThP: Applied Surface Science Poster Session