The Spectroscopic Ellipsometry (EL) Topic integrates themes ranging from classical materials science and thin film characterization to nanometer-scale science and novel optical sensing concepts. We will host four oral sessions dedicated to traditional applications of spectroscopic ellipsometry in optical materials and thin film characterization as well as new and emerging topics. The first oral session is dedicated to topics in analytical methods such as the use of artificial intelligence, noise reduction, and other state-of-the-art methods to big data in ellipsometric analysis. The second oral session will focus on the many industrial applications of ellipsometry. The third oral session will host presentations on classical research topics of material properties through ellipsometry such as semiconductors, thin films, and anisotropic effects. The fourth oral session will focus on emerging technological advances and breakthroughs of spectroscopic ellipsometric instrumentation. The best student paper, which is selected based on the quality of the research, its presentation, and discussion during the symposium, will be awarded with the EL student award. EL will also host a poster session.
EL1-MoM: Big Data, AI, and Analytical Methods
- Long V. Le, Institute of Materials Science, Vietnam Academy of Science and Technology, Viet Nam, “Noise Reduction Using Linear and Nonlinear Filtering”
- Nikolas Podraza, University of Toledo, “Ellipsometry Analysis Overview: Things We Can’t Ignore”
EL2-MoM: Industrial Applications of Spectroscopic Ellipsometry
- Shankar Krishnan, KLA Corporation, “Spectroscopic Ellipsometry and Reflectometry for Advanced Semiconductor Metrology”
- Andre Miller, Intel, “Ellipsometry in Industrial Applications”
EL1+TF-MoA: Thin Films & Novel Materials
- Vanya Darakchieva, Lund University, Sweden, “Enhancement of Electron Effective Mass in Semiconductor Materials and 2DEGs Revealed by THz Optical Hall Effect”
- Rafal Korlacki, University of Nebraska-Lincoln, “Combined Density Functional Theory and Spectroscopic Ellipsometry Studies of Anisotropic Materials”
EL2-MoA: Instrumentation
- Myungjun Lee, Samsung Electronics Co., Inc., Republic of Korea, “Advancing Metrology in Semiconductor Manufacturing: Challenges and Novel Ellipsometry Techniques”
- Troy Ribaudo, Onto Innovation, “Mid-Infrared Ellipsometry for High Aspect Ratio Semiconductor Process Control Applications”
EL-TuP: Spectroscopic Ellipsometry Poster Session